Surface chemical analysis — Secondary ion mass spectrometry — Method for determining yield volume in argon cluster sputter depth profiling of organic materials
€178.00
Gas analysis — Preparation of calibration gas mixtures using dynamic methods
€113.00
Surface chemical analysis — Near real-time information from the X-ray photoelectron spectroscopy survey scan — Rules for identification of, and correction for, surface contamination by carbon-containing compounds
Microfluidic devices Interoperability requirements for dimensions, connections and initial device classification
Surface chemical analysis — Secondary ion mass spectrometry — Method for the measurement of mass resolution in SIMS
Surface chemical analysis — X-ray photoelectron spectroscopy — Guidelines for analysis
Microbeam analysis — Electron backscatter diffraction — Measurement of average grain size
€152.00
Surface chemical analysis — Measurement of lateral and axial resolutions of a Raman microscope
€75.00
Surface chemical analysis — Depth profiling — Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering
Surface chemical analysis — Auger electron spectroscopy and X-ray photoelectron spectroscopy — Methods used to determine peak intensities and information required when reporting results
Surface chemical analysis — X-ray photoelectron spectroscopy — Measurement of silicon oxide thickness
Surface chemical analysis — X-ray photoelectron spectroscopy — Procedures for assessing the day-to-day performance of an X-ray photoelectron spectrometer
Surface chemical analysis — Characterization of nanostructured materials
€204.00
Surface chemical analysis — X-ray photoelectron spectroscopy — Procedures for determining backgrounds
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Surface chemical analysis — Analysis of metal oxide films by glow-discharge optical-emission spectrometry
