Superseded Standard
Historical

ASTM E1127-03

Standard Guide for Depth Profiling in Auger Electron Spectroscopy

Summary

1.1 This guide covers procedures used for depth profiling in Auger electron spectroscopy.

1.2 Guidelines are given for depth profiling by the following:

Section
Ion Sputtering6
Angle Lapping and Cross-Sectioning7
Mechanical Cratering8
Nondestructive Depth Profiling9

1.3 This standard does not purport to address all of the safety problems, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.


Significance and Use:

Auger electron spectroscopy yields information concerning the chemical and physical state of a solid surface in the near surface region. Nondestructive depth profiling is limited to this near surface region. Techniques for measuring the crater depths and film thicknesses are given in (35).

Ion sputtering is primarily used for depths of less than the order of 1 μm.

Angle lapping or mechanical cratering is primarily used for depths greater than the order of 1 μm.

The choice of depth profiling methods for investigating an interface depends on surface roughness, interface roughness, and film thickness (1).3

Technical characteristics

Publisher American Society for Testing and Materials (ASTM International)
Publication Date 05/10/2003
Collection
Page Count 5
Themes Physicochemical methods of analysis
EAN ---
ISBN ---
Weight (in grams) ---