DIN 50451-3:2002-01

Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 3: Determination of 31 elements in high-purity nitric acid by ICP-MS

Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 3: Aluminium (Al), Arsenic (As), Barium (Ba), Beryllium (Be), Bismuth (Bi), Calcium (Ca), Cadmium (Cd), Cobalt (Co), Chromium (Cr), Copper (Cu), Iron (Fe), Gallium (Ga), Germanium (Ge), Hafnium (Hf), Indium (In), Potassium (K), Lithium (Li), Magnesium (Mg), Manganese (Mn), Molybdenum (Mo), Nickel (Ni), Niobium (Nb), Lead (Pb), Antimony (Sb), Tin (Sn), Strontium (Sr), Tantalum (Ta), Titanium (Ti), Vanadium (V), Zinc (Zn), Zirconium (Zr) in nitric acid by ICP-MS

Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 3: Aluminium (Al), cobalt (Co), copper (Cu), sodium (Na), nickel (Ni) and zinc (Zn) in nitric acid by ICP-MS

Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 3: Aluminium (Al), cobalt (Co), copper (Cu), sodium (Na), nickel (Ni), and zinc (Zn) in nitric acid with ICP-MS

Testing of materials for semiconductor technology - Determination of traces of metals in liquids - Part 3: Al, Co, Cu, Na, Ni and Zn in nitric acid with ICP-MS