Superseded Standard
Historical

DIN 50453-2:1990-10

Testing of materials for semiconductor technology; determination of etch rates of etching mixtures; silicium-dioxid coating; optical method

Summary

The standard defines the test method for the determination of etch rates of etch mixtures on siliciumdioxid coatings.

Technical characteristics

Publisher Deutsche Institut für Normung e.V. (DIN)
Publication Date 10/01/1990
Page Count 2
EAN ---
ISBN ---
Weight (in grams) ---
No products.