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ISO 21859:2019 (R2024)
Fine ceramics (advanced ceramics, advanced technical ceramics) — Test method for plasma resistance of ceramic components in semiconductor manufacturing equipment
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Summary
This document specifies a test method for plasma resistance of ceramic components in semiconductor manufacturing equipment. It is applicable to ceramic components of plasma-resistant components in dry etching chambers used in semiconductor manufacturing.
Notes
90.93 : Norme internationale confirmée
Technical characteristics
| Publisher | International Organization for Standardization (ISO) |
| Publication Date | 06/18/2019 |
| Confirmation Date | 10/04/2024 |
| Edition | 1 |
| Page Count | 4 |
| EAN | --- |
| ISBN | --- |
| Weight (in grams) | --- |
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