Summary
These specifications cover the general requirements for pellicles used as a protection on photomasks. The specifications widely correspond to the standardizations prepared by SEMI (Semiconductor Equipment and Materials Institute) in the USA. Applications using deep-UV-exposure (wayelength <=360 nm) are not yet taken into account.
Technical characteristics
| Publisher | Deutsche Institut für Normung e.V. (DIN) |
| Publication Date | 06/01/1990 |
| Cancellation Date | 03/01/1999 |
| Page Count | 4 |
| EAN | --- |
| ISBN | --- |
| Weight (in grams) | --- |
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