29.045 : Semiconducting materials

ASTM F1391-93(2000)

ASTM F1391-93(2000)

Withdrawn Most Recent

Standard Test Method for Substitutional Atomic Carbon Content of Silicon by Infrared Absorption (Withdrawn 2003)

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ASTM F1392-00

ASTM F1392-00

Superseded Historical

Standard Test Method for Determining Net Carrier Density Profiles in Silicon Wafers by Capacitance-Voltage Measurements With a Mercury Probe

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ASTM F1393-92(1997) (R1992)

ASTM F1393-92(1997) (R1992)

Superseded Historical

Standard Test Method for Determining Net Carrier Density in Silicon Wafers by Miller Feedback Profiler Measurements With a Mercury Probe

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ASTM F1451-92(1999)

ASTM F1451-92(1999)

Withdrawn Most Recent

Standard Test Method for Measuring Sori on Silicon Wafers by Automated Noncontact Scanning (Withdrawn 2003)

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ASTM F1526-95(2000)

ASTM F1526-95(2000)

Withdrawn Most Recent

Standard Test Method for Measuring Surface Metal Contamination on Silicon Wafers by Total Reflection X-Ray Fluorescence Spectroscopy (Withdrawn 2003)

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ASTM F1527-00

ASTM F1527-00

Superseded Historical

Standard Guide for Application of Silicon Standard Reference Materials and Reference Wafers for Calibration and Control of Instruments for Measuring Resistivity of Silicon

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ASTM F1528-94(1999)

ASTM F1528-94(1999)

Withdrawn Most Recent

Standard Test Method for Measuring Boron Contamination in Heavily Doped N-Type Silicon Substrates by Secondary Ion Mass Spectrometry (Withdrawn 2003)

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ASTM F1529-97

ASTM F1529-97

Withdrawn Most Recent

Standard Test Method for Sheet Resistance Uniformity Evaluation by In-Line Four-Point Probe with the Dual-Configuration Procedure (Withdrawn 2003)

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ASTM F1530-94

ASTM F1530-94

Superseded Historical

Standard Test Method for Measuring Flatness, Thickness, and Thickness Variation on Silicon Wafers by Automated Noncontact Scanning

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ASTM F1535-00

ASTM F1535-00

Withdrawn Most Recent

Standard Test Method for Carrier Recombination Lifetime in Silicon Wafers by Noncontact Measurement of Photoconductivity Decay by Microwave Reflectance (Withdrawn 2003)

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ASTM F1569-94(1999)

ASTM F1569-94(1999)

Withdrawn Most Recent

Standard Guide for Generation of Consensus Reference Materials for Semiconductor Technology (Withdrawn 2003)

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ASTM F1618-96

ASTM F1618-96

Superseded Historical

Standard Practice for Determination of Uniformity of Thin Films on Silicon Wafers

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ASTM F1619-95(2000)e1 (R1995)

ASTM F1619-95(2000)e1 (R1995)

Withdrawn Most Recent

Standard Test Method for Measurement of Interstitial Oxygen Content of Silicon Wafers by Infrared Absorption Spectroscopy with p-Polarized Radiation Incident at the Brewster Angle (Withdrawn 2003)

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ASTM F1620-96

ASTM F1620-96

Withdrawn Most Recent

Standard Practice for Calibrating a Scanning Surface Inspection System Using Monodisperse Polystyrene Latex Spheres Deposited on Polished or Epitaxial Wafer Surfaces (Withdrawn 2003)

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ASTM F1621-96

ASTM F1621-96

Withdrawn Most Recent

Standard Practice for Determining the Positional Accuracy Capabilities of a Scanning Surface Inspection System (Withdrawn 2003)

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