Surface chemical analysis — Secondary-ion mass spectrometry — Determination of boron atomic concentration in silicon using uniformly doped materials
€152.00
Gas mixtures — Gravimetric preparation — Mastering correlations in composition
€113.00
Surface chemical analysis — Auger electron spectroscopy — Reporting of methods used for charge control and charge correction
Gas analysis — Preparation of calibration gas mixtures using dynamic volumetric methods
Gas analysis — Preparation of calibration gas mixtures using dynamic methods
€178.00
Abstract General information
€75.00
Reference materials — Good practice in using reference materials
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Reference materials Guidance on, and keywords used for, RM categorization
Surface chemical analysis — Scanning-probe microscopy — Measurement of drift rate
Surface chemical analysis — Glow discharge mass spectrometry (GD-MS) — Introduction to use
Surface chemical analysis — General procedures for quantitative compositional depth profiling by glow discharge optical emission spectrometry
Surface chemical analysis — Scanning-probe microscopy — Determination of cantilever normal spring constants
Microbeam analysis — Electron probe microanalysis — Methods for elemental-mapping analysis using wavelength-dispersive spectroscopy
Surface chemical analysis — Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy
€21.00
