71.040 : Analytical chemistry

71.040.01

Analytical chemistry in general

71.040.10

Chemical laboratories. Laboratory equipment

71.040.20

Laboratory ware and related apparatus

71.040.30

Chemical reagents

71.040.40

Chemical analysis

71.040.50

Physicochemical methods of analysis

71.040.99

Other standards related to analytical chemistry
ISO 16413:2013

ISO 16413:2013

Superseded Historical

Evaluation of thickness, density and interface width of thin films by X-ray reflectometry — Instrumental requirements, alignment and positioning, data collection, data analysis and reporting

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ISO 6556:2012 (R2019)

ISO 6556:2012 (R2019)

Active Most Recent

Laboratory glassware Filter flasks

€75.00

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ISO 16531:2013

ISO 16531:2013

Superseded Historical

Surface chemical analysis — Depth profiling — Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS

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ISO 22309:2011 (R2022)

ISO 22309:2011 (R2022)

Active Most Recent

Microbeam analysis — Quantitative analysis using energy-dispersive spectrometry (EDS) for elements with an atomic number of 11 (Na) or above

€152.00

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ISO 6142-1:2015 (R2020)

ISO 6142-1:2015 (R2020)

Active Most Recent

Gas analysis — Preparation of calibration gas mixtures

€204.00

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ISO 6145-6:2017 (R2025)

ISO 6145-6:2017 (R2025)

Active Most Recent

Gas analysis — Preparation of calibration gas mixtures using dynamic methods

€178.00

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ISO 17862:2013

ISO 17862:2013

Superseded Historical

Surface chemical analysis — Secondary ion mass spectrometry — Linearity of intensity scale in single ion counting time-of-flight mass analysers

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ISO 16592:2012 (R2023)

ISO 16592:2012 (R2023)

Active Most Recent

Microbeam analysis — Electron probe microanalysis — Guidelines for determining the carbon content of steels using a calibration curve method

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ISO 17109:2015

ISO 17109:2015

Superseded Historical

Surface chemical analysis — Depth profiling — Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films

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ISO 23833:2013

ISO 23833:2013

Active Most Recent

Abstract General information

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ISO 14706:2014 (R2021)

ISO 14706:2014 (R2021)

Active Most Recent

Surface chemical analysis — Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy

€152.00

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ISO 18337:2015 (R2022)

ISO 18337:2015 (R2022)

Active Most Recent

Surface chemical analysis — Surface characterization — Measurement of the lateral resolution of a confocal fluorescence microscope

€75.00

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ISO/TS 18507:2015 (R2023)

ISO/TS 18507:2015 (R2023)

Active Most Recent

Surface chemical analysis — Use of Total Reflection X-ray Fluorescence spectroscopy in biological and environmental analysis

€178.00

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ISO 18554:2016 (R2021)

ISO 18554:2016 (R2021)

Active Most Recent

Surface chemical analysis — Electron spectroscopies — Procedures for identifying, estimating and correcting for unintended degradation by X-rays in a material undergoing analysis by X-ray photoelectron spectroscopy

€113.00

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ISO 14606:2015

ISO 14606:2015

Superseded Historical

Surface chemical analysis — Sputter depth profiling — Optimization using layered systems as reference materials

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