VDI/VDE 5575 Blatt 4:2017-10

This standard deals with reflective X-ray optics by employing total external reflection or Bragg reflection on inner interfaces of a multilayer structure to influence the spectral composition and the directional characteristic. The physical basics and important parameters of X-ray optics are described. The role and the influence of substrate and coating are explained in detail. Total external reflection and multilayer mirrors for several applications are discussed. The most common X-ray optical systems using X-ray mirrors such as Kirkpatrick-Baez, Wolter, Schwarzschild, Montel and EUVL optics are briefly introduced. This standard addresses users, developers and producers of X-ray optics and people, who are working at X-ray sources such as diffractometers, synchrotron sources, electron storage rings and free-electron-lasers. Typical research areas are diffraction, scattering, tomography, and microscopy with X-ray radiation in order to investigate matters in their wide diversity.