29.045 : Semiconducting materials

BS IEC 62899-203-2:2025

BS IEC 62899-203-2:2025

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Printed electronics Materials. Semiconductor ink. Space charge limited mobility measurement in printed organic semiconductive layers

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IEC 60146-1-1:2024/COR1:2025

IEC 60146-1-1:2024/COR1:2025

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IEC 60146-1-1:2024/COR1:2025 Corrigendum 1 - Semiconductor converters - General requirements and line commutated converters - Part 1-1: Specification of basic requirements

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BS EN IEC 60146-1-1:2024

BS EN IEC 60146-1-1:2024

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Semiconductor converters. General requirements and line commutated converters Specification of basic

€421.00

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DIN 50455-1:2008-04

DIN 50455-1:2008-04

Superseded Historical

Testing of materials for semiconductor technology - Methods for characterizing photoresists - Part 1: Determination of coating thickness with optical methods

€41.78

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DIN 50452-2:2008-04

DIN 50452-2:2008-04

Superseded Historical

Testing of materials for semiconductor technology - Test method for particle analysis in liquids - Part 2: Determination of particles by optical particle counters

€56.17

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DIN 50451-5:2008-09

DIN 50451-5:2008-09

Superseded Historical

Testing of materials for semiconductor technology - Determination of trace elements in liquids - Part 5: Guideline for the selection of materials and testing of their suitability for apparatus for sampling and sample preparation for the determination of trace elements in the range of micrograms per kilogram and nanograms per kilogram

€48.79

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DIN 50457-2:1999-11

DIN 50457-2:1999-11

Withdrawn Most Recent

Testing of materials for semiconductor technology - Determination of the volume fraction of components in dopant gas mixtures by wet-chemical methods - Part 2: Phosphine in nitrogen phosphine mixtures

€34.30

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DIN 50457-1:1999-11

DIN 50457-1:1999-11

Withdrawn Most Recent

Testing of materials for semiconductor technology - Determination of the volume fraction of components in dopant gas mixtures by wet-chemical methods - Part 1: Diborane in hydrogen diborane mixtures

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DIN 50441-5:2001-04

DIN 50441-5:2001-04

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Testing of materials for semiconductor technology - Determination of the geometric dimensions of semiconductor wafers - Part 5: Terms of shape and flatness deviation

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DIN 50453-3:2001-04

DIN 50453-3:2001-04

Withdrawn Most Recent

Testing of materials for semiconductor technology - Determination of etch rates of etching mixtures - Part 3: Aluminium, gravimetric method

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DIN 50438-3:1999-08

DIN 50438-3:1999-08

Superseded Historical

Testing of materials for use in semiconductor technology - Determination of impurity content of silicon by infrared absorption - Part 3: Boron and phosphorus

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DIN 50454-1:2000-07

DIN 50454-1:2000-07

Withdrawn Most Recent

Testing of materials for semiconductor technology - Determination of dislocations in monocrystals of III-V-compound semi-conductors - Part 1: Gallium arsenide

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DIN 50438-3:2000-12

DIN 50438-3:2000-12

Withdrawn Most Recent

Testing of materials for use in semiconductor technology - Determination of impurity content silicon by infrared absorption - Part 3: Boron and phosphorus

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DIN 50451-3:2014-11

DIN 50451-3:2014-11

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Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 3: Determination of 31 elements in high-purity nitric acid by ICP-MS

€77.20

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DIN 50451-6:2014-11

DIN 50451-6:2014-11

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Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 6: Determination of 36 elements in a high-purity ammonium fluoride solution (NHF) and in etching mixtures of high-purity ammonium fluoride solution containing hydrofluoric acid

€63.27

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