29.045 : Semiconducting materials

DIN 50438-1:1995-07

DIN 50438-1:1995-07

Withdrawn Most Recent

Testing of materials for semiconductor technology - Determination of impurity content in silicon by infrared absorption - Part 1: Oxygen

€56.17

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DIN 50446:1995-09

DIN 50446:1995-09

Withdrawn Most Recent

Testing of materials for semiconductor technology - Determination of defect types and defect densities of silicon epitaxial layers

€56.17

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DIN 50449-1:1995-11

DIN 50449-1:1995-11

Superseded Historical

Testing of materials for semiconductor technology - Determination of impurity content in semiconductors by infrared absorption - Part 1: Carbon in gallium arsenide

€48.79

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DIN 50448:1995-12

DIN 50448:1995-12

Superseded Historical

Testing of materials for semiconductor technology - Contactless determination of the electrical resistivity of semi-insulating semiconductor slices using a capacitive probe

€41.78

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DIN 50440:1995-12

DIN 50440:1995-12

Superseded Historical

Testing of materials for semiconductor technology - Measurement of carrier lifetime in silicon single crystals - Recombination carrier lifetime at low injection by photoconductivity method

€48.79

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DIN 50449-2:1996-02

DIN 50449-2:1996-02

Superseded Historical

Testing of materials for semiconductor technology - Determination of impurity content in semiconductors by infrared absorption - Part 2: Boron in gallium arsenide

€34.30

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DIN 50441-2:1996-03

DIN 50441-2:1996-03

Superseded Historical

Testing of materials for semiconductor technology - Determination of the geometric dimensions of semiconductor wafers - Part 2: Testing of edge profile

€34.30

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DIN 50449-1:1997-07

DIN 50449-1:1997-07

Withdrawn Most Recent

Testing of materials for semiconductor technology - Determination of impurity content in semiconductors by infrared absorption - Part 1: Carbon in gallium arsenide

€41.78

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DIN 50441-4:1997-11

DIN 50441-4:1997-11

Superseded Historical

Testing of materials for semiconductor technology - Determination of the geometric dimensions of semiconductor wafers - Part 4: Slice diameter, diameter variation, flat diameter, flat length, flat depth

€48.79

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DIN 50448:1998-01

DIN 50448:1998-01

Withdrawn Most Recent

Testing of materials for semiconductor technology - Contactless determination of the electrical resistivity of semi-insulating semi-conductor slices using a capacitive probe

€34.30

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DIN 50449-2:1998-01

DIN 50449-2:1998-01

Withdrawn Most Recent

Testing of materials for semiconductor technology - Determination of impurity content in semiconductors by infrared absorption - Part 2: Boron in gallium arsenide

€34.30

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DIN 50457-1:1998-01

DIN 50457-1:1998-01

Superseded Historical

Testing of materials for semiconductor technology - Determination of the volume fraction of components in dopant gas mixtures by wet-chemical methods - Part 1: Diborane in hydrogen diborane mixtures

€34.30

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DIN 50457-2:1998-01

DIN 50457-2:1998-01

Superseded Historical

Testing of materials for semiconductor technology - Determination of the volume fraction of components in dopant gas mixtures by wet-chemical methods - Part 2: Phosphine in nitrogen phosphine mixtures

€34.30

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DIN 50456-3:1998-03

DIN 50456-3:1998-03

Superseded Historical

Testing of materials for semiconductor technology - Method for the characterisation of moulding compounds for electronic components - Part 3: Determination of cationic impurities

€34.30

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DIN 50441-5:1998-05

DIN 50441-5:1998-05

Superseded Historical

Testing of materials for semiconductor technology - Determination of the geometric dimensions of semiconductor wafers - Part 5: Terms of shape and flatness deviation

€56.17

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